Vertical-HVPE as a Production Method for Free-Standing GaN-Substrates
B. Schineller, J. Kaeppeler, M. Heuken
AIXTRON AG, Kackertstrasse 15-17, D-52072 Aachen,
Phone: +49-241-8909-193, fax: +49-241-8909-40, e-mail: b.schineller@aixtron.com
Keywords: GaN substrates, HVPE, boule growh
Abstract
The cost effective growth of free standing GaN substrates requires the boule growth approach. We developed a Vertical Hydride Vapor Phase Epitaxy (VHVPE) tool for the growth of up to 7 cm long GaN boules
of 2 inch size. Prototypes were built and optimized with respect to
total growth rate, parasitic ammonium chloride deposition and growth
uniformity of the boule.
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